High Performance Process Chemicals for CVD Applications

Twitter Facebook RSS

MOCVD Precursors III/V – Compounds

By DockChemicals

Chemicals for CVD Applications
Precisely designed to your process

The DOCK/CHEMICALS Solutions include a wide range of process chemicals for CVD applications. Please find an extraction below. If you’re looking for a special solution, don’t hesitate to contact us.

MOCVD Precursors III/V – Compounds

TBAs
TMAs
DETBAs
Tertiarybutylarsine (» PDF)
Trimethylarsine
Diethyltertiarybutylarsine

TBP
DETBUP
Tertiarybutylphosphine (» PDF)
Diethyltertiarybutylphosphine

N – Hydrazines
TBHy
UDMHy
Tertiarybutylhydrazine
Dimethylhydrazine

Sb – Antimonides
TMSb
TESb
Trimethylantimony
Triethylantimony

Bi – Bismuth
TMBi
Trimethylbismuth

B – Boron
TEB
TTBB
Triethylboron
Tritertiarybutylboron

Al – Aluminium  
TMAl
TTBAl
Trimethylaluminum
Tris(tertiarybutyl)aluminium

Ga – Gallium
TMGa
TEGa
TTBGa
Trimethylgallium
Triethylgallium
Tritertiarybutylgallium

In – Indium
TMIn
DADI
Trimethylindium
Dimethylaminopropyl-dimethyl-indium